Fabricating and characterizing of ZnO nanostructure solar cells
journal of kerbala university,
2013, Volume 9, Issue 2, Pages 287-292
AbstractZinc oxide (ZnO) thin film on crystalline silicon (c-Si) substrate has been deposited by RF sputtering method to use it for fabricating a solar cell. Structural properties of ZnO films studied using high resolution X-ray diffraction (HRXRD) analysis of the films which show that the films have polycrystalline nature with orientation (002). Small crystallite size of prepared films was calculated using Scherrir formula that indicates our films are within Nano scale. In addition, optical properties have been done via scanning electron microscopy (SEM) which used to describe the surface morphology and Photoluminescence (PL) measurements which revealed that the energy bandgap of prepared films were in the UV emission at 380 nm. Finally, thickness of the films was measured with Filmetric (F-20). Our findings were the fabricated ZnO films are successful in simple and low cost method with high quality and unexpected nanostructure behavior. Good current-voltage behavior with high conversion efficiency of 14.5 % has been obtained.
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