Author : Abdul Hadi Kareem Al-Enizi, Nada
Study the Effect of Ambient Oxygen Pressure on Structural and Optical Properties of Pure SnO2Thin films Prepared by Pulsed Laser Deposition
journal of kerbala university,
Volume 8, Issue 1, Pages 210-216
Polycrystalline pure SnO2 thin films were deposited on glass substrates at fixed substrate temperature (400C°) by (Nd-YAG )pulsed laser deposition (PLD) with pulse energy(5000 mJ), pulse width(10ns) at a different ambient oxygen pressure (10-1,10-2,10-3) torr. The effect of ambient oxygen pressure on the structural and optical properties of SnO2 thin films was studied. (XRD) X-ray diffraction and AFM (atomic force microscopy) methods were used to examine the structure and morphology of the films in this work. From (XRD) X-ray diffraction of the SnO2 films, it was found that the deposited films showed some differences compared with the oxygen pressure and the intensities of the peaks of the crystalline phases decreased with the increase of oxygen. From AFM images, the distinct variations in the morphology of the thin films were also observed, from the transmittance of SnO2 it was found that the optical transmission of SnO2 films at high oxygen pressure is low than for low ambient oxygen pressure.